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8 March 2002 Two-class pattern classification using principal component analysis
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Proceedings Volume 4664, Machine Vision Applications in Industrial Inspection X; (2002) https://doi.org/10.1117/12.460192
Event: Electronic Imaging, 2002, San Jose, California, United States
Abstract
A two-class classification method of image patterns using principal component analysis (PCA) is proposed, in which classification is performed in the two-dimensional (2-D) space constructed by the reconstruction errors. The reconstruction error is computed using PCA for each assumed class. Training data sets are used to compute eigenvectors with which PCA reduces the dimensionality of the input vector space and reconstructs an input vector in the reduced space. The line equation with two parameters is defined as a linear decision boundary and these parameters are estimated by probabilistic approach. Also its application to face detection is experimented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hyoung-Joo Ahn and Rae-Hong Park "Two-class pattern classification using principal component analysis", Proc. SPIE 4664, Machine Vision Applications in Industrial Inspection X, (8 March 2002); https://doi.org/10.1117/12.460192
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