UV-laser conditioning for reduction of 351-nm damage initiation in fused silica

Raymond M. Brusasco; Bernie M. Penetrante; John E. Peterson; Stephen M. Maricle; Joseph A. Menapace

doi:10.1117/12.461718

9 April 2002 UV-laser conditioning for reduction of 351-nm damage initiation in fused silica

Raymond M. Brusasco, Bernie M. Penetrante, John E. Peterson, Stephen M. Maricle, Joseph A. Menapace

Author Affiliations +

Proceedings Volume 4679, Laser-Induced Damage in Optical Materials: 2001; (2002) https://doi.org/10.1117/12.461718
Event: Boulder Damage, 2001, Boulder, CO, United States

Abstract

This paper describes the effect of 355-nm laser conditioning on the concentration of UV-laser-induced surface damage sites on large-aperture fused silica optics. We will show the effect of various 355-nm laser conditioning methodologies on the reduction of surface-damage initiation in fused silica samples that have varying qualities of polishing. With the best, generally available fused silica optic, we have demonstrated that 355-nm laser conditioning can achieve up to 10x reduction in surface damage initiation concentration in the fluence range of 10-14 J/cm² (355- nm at 3 ns).

Citation Download Citation

Raymond M. Brusasco, Bernie M. Penetrante, John E. Peterson, Stephen M. Maricle, and Joseph A. Menapace "UV-laser conditioning for reduction of 351-nm damage initiation in fused silica", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); https://doi.org/10.1117/12.461718

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