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1 July 2002 100-picometer interferometry for EUVL
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Future extreme ultraviolet lithography (EUVL) steppers will, in all likelihood, have six-mirror projection cameras. To operate at the diffraction limit over an acceptable depth of focus each aspheric mirror will have to be fabricated with an absolute figure accuracy approaching 100pm rms. We are currently developing visible light interferometry to meet this need based on modifications of our present phase shifting diffraction interferometry (PSDI) methodology where we achieved an absolute accuracy of 250pm. The basic PSDI approach has been further simplified, using lensless imaging based on computational diffractive back-propagation, to eliminate auxiliary optics that typically limit measurement accuracy. Small remaining error sources, related to geometric positioning, CCD camera pixel spacing and laser wavelength, have been modeled and measured. Using these results we have estimated the total system error for measuring off-axis aspheric EUVL mirrors with this new approach to interferometry.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gary E. Sommargren, D. W. Phillion, Michael A. Johnson, Nhan Q. Nguyen, Anton Barty, Franklyn J. Snell, Daren R. Dillon, and Lloyd S. Bradsher "100-picometer interferometry for EUVL", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002);

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