Metrology of optical constants for sub-200-nm lithographic films

Michael J. Anderson; Eileen Clifford

doi:10.1117/12.473462

16 July 2002 Metrology of optical constants for sub-200-nm lithographic films

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473462
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The measurement of optical constants for materials intended for use at wavelengths less than 200 nm is critical for production monitoring and process control when manufacturing devices with features of 0.15 micrometers or smaller. The challenges of organic ARC film measurement at 193 nm are due to the more complicated optical spectral signatures of the organic films and the necessary signal to noise improvements in the ultraviolet. Sharp features in the spectra of the organic ARC films are used to control the extinction value of the films, and they complicate the analysis of the optical constants. Research grade instruments available have shown the ability to accurately measure these films at 193 nm. We report here the results of using next generation optical metrology equipment to measure the optical constants on these difficult organic ARC films on a production level. Specific examples of production level monitoring of the optical constants of these films will be presented.

Citation Download Citation

Michael J. Anderson and Eileen Clifford "Metrology of optical constants for sub-200-nm lithographic films", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473462

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