New developments in excimer laser metrology at 157 nm

Marla L. Dowell; Richard D. Jones; Holger Laabs; Christopher L. Cromer; Robert D. Morton

doi:10.1117/12.473515

16 July 2002 New developments in excimer laser metrology at 157 nm

Marla L. Dowell, Richard D. Jones, Holger Laabs, Christopher L. Cromer, Robert D. Morton

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473515
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We have constructed a prototype calorimeter that will serve as a primary standard for measurements of 157 nm excimer laser power and energy. The construction and performance of the prototype will be discussed. In addition, we have performed a series of thermal characterization measurements on the prototype. From these measurements, we deduce that the uncertainty in the prototype's electrical calibration factor is less than 0.2 percent. This number is less than or comparable to the uncertainty of the NIST primary standards for use with 193 and 248 nm excimer lasers. The 157 nm standards are part of a beamsplitter-based measurement system for laser power and energy calibrations. To control and determine the ambient measurement conditions, we have constructed a nitrogen-purged enclosure for this system. We are able to achieve O2 concentrations of less than 3 parts per million (ppm) inside the enclosure.

Citation Download Citation

Marla L. Dowell, Richard D. Jones, Holger Laabs, Christopher L. Cromer, and Robert D. Morton "New developments in excimer laser metrology at 157 nm", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473515

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