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16 July 2002 Simulation of imaging in projection microscope using multibeam probe
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Abstract
We show simulation images of projection microscope, which uses parallel beam to the sample, detecting secondary electrons, photoelectrons and mirror electrons using electrons and UV/X-ray sources as probe beam. The results show we can see image for square and dense line patterns without charging and damage in the objects. This research can be used for quantitative analysis for projection microscope using multi beam source to get comprehensive information of many characteristics of objects as well as topographic information.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yeong-Uk Ko and David C. Joy "Simulation of imaging in projection microscope using multibeam probe", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473497
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