Dissolution inhibitors for 157-nm microlithography

Will Conley; Daniel A. Miller; Charles R. Chambers; Brian Philip Osborn; Raymond Jui-Pu Hung; Hoang Vi Tran; Brian C. Trinque; Matthew J. Pinnow; Takashi Chiba; Scott McDonald; Paul Zimmerman; Ralph R. Dammel; Andrew R. Romano; C. Grant Willson

doi:10.1117/12.474282

24 July 2002 Dissolution inhibitors for 157-nm microlithography

Will Conley, Daniel A. Miller, Charles R. Chambers, Brian Philip Osborn, Raymond Jui-Pu Hung, Hoang Vi Tran, Brian C. Trinque, Matthew J. Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph R. Dammel, Andrew R. Romano, C. Grant Willson

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474282
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Fluorocarbon based polymers have been identified as promising resist candidates for 157nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157nm resist materials based on transparent dissolution inhibitors. These 2 component resist systems have been prepared and preliminary imaging studies at 157nm are described. Several new approaches to incorporating these transparent monomers into functional polymers have been investigated and are described. The lithographic performance of some of these polymers is discussed.

Citation Download Citation

Will Conley, Daniel A. Miller, Charles R. Chambers, Brian Philip Osborn, Raymond Jui-Pu Hung, Hoang Vi Tran, Brian C. Trinque, Matthew J. Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph R. Dammel, Andrew R. Romano, and C. Grant Willson "Dissolution inhibitors for 157-nm microlithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474282

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