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24 July 2002 Improvement of line edge roughness by employing new PAG
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Abstract
Novel organic PAGs have been prepared in order to improve line edge roughness (LER) of 248nm and 193nm resists. From careful design of PAG, transparent, highly diffusive PAG was successfully prepared. New PAGs have increased hydrophilicity in cationic portion of PAG(photoacid generator.).
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Yang-Sook Kim, Yun-Hyi Kim, Sang-Hyang Lee, Yun-Gill Yim, Deog-Bae Kim, and Jae-Hyun Kim "Improvement of line edge roughness by employing new PAG", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474285
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