Organoelement resists for EUV lithography

Junyan Dai; Christopher Kemper Ober; Lin Wang; Franco Cerrina; Paul F. Nealey

doi:10.1117/12.474197

24 July 2002 Organoelement resists for EUV lithography

Junyan Dai, Christopher Kemper Ober, Lin Wang, Franco Cerrina, Paul F. Nealey

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474197
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

EUV lithography is perhaps the most promising of the NGL technologies for sub-100nm resolution. To address needs in this area, we have designed and synthesized several types of organoelement resists using only low absorbing elements, including H, C, Si and B. One category is based on silicon-containing block and random polymers. They show high transparency according to theoretical simulations and have high oxygen reactive ion etch resistances compared to Novolac resins. In a preliminary study, we were able to image these polymers to 180 nm line/space patterns using EUV exposure. A second type of EUV transparent resist platform involves boron-containing polymers. Carborane carboxylic acid was attached to a copolymer backbone to introduce boron atoms with controlled attachment level. It was found that incorporation of a small amount of B provides remarkably high oxygen etch resistance.

Citation Download Citation

Junyan Dai, Christopher Kemper Ober, Lin Wang, Franco Cerrina, and Paul F. Nealey "Organoelement resists for EUV lithography", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474197

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available