Processing techniques for novel BARC chemistries

Nickolas L. Brakensiek; Chris Cox; Rama Puligadda

doi:10.1117/12.474180

Translator Disclaimer

24 July 2002 Processing techniques for novel BARC chemistries

Nickolas L. Brakensiek, Chris Cox, Rama Puligadda

Author Affiliations +

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474180
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Previous generations of Bottom Anti-Reflective Coatings (BARCs) have had excellent optical properties but the etch performance for these BARC's were only 30% faster than the photoresist at best. A novel BARC chemistry has increased the capability of the photolithography process; this new chemistry has the capability to change etch and optical properties by the BARC bake process. This paper will present the bake process changes required to modify both etch characteristics and optical properties. Etch characteristics that were measured were bulk etch rate and etch selectivity to photoresist. Index of refraction and the absorption coefficients were measured for optical properties. Photolithography results focusing on Acetal and Hybrid photoresist types will be presented with specific attention to critical dimension control and focus latitude shifts, if any, associated with these BARC bake process changes.

Citation Download Citation

Nickolas L. Brakensiek, Chris Cox, and Rama Puligadda "Processing techniques for novel BARC chemistries", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474180

ACCESS THE FULL ARTICLE