Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga; Hidenori Watanabe; Takahito Kumazaki; Naoki Kitatochi; Kotaro Sasano; Yoshifumi Ueno; Masayuki Konishi; Takashi Suganuma; Masaki Nakano; Toshio Yamashita; Toshihiro Nishisaka; Ryoichi Nohdomi; Kazuaki Hotta; Hakaru Mizoguchi; Kiyoharu Nakao

doi:10.1117/12.474613

30 July 2002 Development of a 5-kHz ultra-line-narrowed F₂ laser for dioptric projection systems

Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, Kiyoharu Nakao

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474613
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65 nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F₂ laser for dioptric projection systems is currently being developed under the ASET project of The F₂ Laser Lithography Development Project. The target of this project is to achieve a F₂ laser spectral bandwidth below 0.2 pm (FWHM) and an average power of 25 W at a repetition rate of 5 kHz. The energy stability (3-sigma) target is less than 10%. An Oscillator-Amplifier arrangement at 2 kHz was developed as a first step of an Ultra-Line-Narrowed F₂ laser system. With this laser system, we did the basic study of the synchronization technology for line narrowing operation using two system arrangements: MOPA (Master Oscillator/Power Amplifier) and Injection Locking. Based on this experience we have developed the 5 kHz system. With the 5 kHz Line-Narrowed Injection Locking system, we have achieved a spectral bandwidth of < 0.2 pm with an output energy of > 5 mJ and an energy pulse to pulse stability of 10%. The feasibility of a 5 kHz Ultra-Line-Narrowed F₂ Laser for Dioptric Projection Systems has been demonstrated.

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Tatsuya Ariga, Hidenori Watanabe, Takahito Kumazaki, Naoki Kitatochi, Kotaro Sasano, Yoshifumi Ueno, Masayuki Konishi, Takashi Suganuma, Masaki Nakano, Toshio Yamashita, Toshihiro Nishisaka, Ryoichi Nohdomi, Kazuaki Hotta, Hakaru Mizoguchi, and Kiyoharu Nakao "Development of a 5-kHz ultra-line-narrowed F₂ laser for dioptric projection systems", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474613

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