Image enhancement through square illumination shaping

Bruce W. Smith; Geert Vandenberghe

doi:10.1117/12.474535

30 July 2002 Image enhancement through square illumination shaping

Bruce W. Smith, Geert Vandenberghe

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474535
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Optical imaging is traditionally carried out using circular pupils, assuring the absence of orientation dependency. In the case of IC microlithography however, such dependency exists and is generally limited to orthogonal axes. We have previously reported the potential improvement to lithographic imaging through the use of a square character to an illumination pupil using fully open pupils, square rings, and slot shapes. In this paper we show lithographic results for this shaping at 193nm using a full field (ASML) imaging tool. Results show improvement in both DOF and exposure latitude over conventional circular shaping, leading to the consideration of this approach as a manufacturable method of resolution enhancement.

Citation Download Citation

Bruce W. Smith and Geert Vandenberghe "Image enhancement through square illumination shaping", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474535

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