Improvement of two-photon absorption lithography

Masato Shibuya; Hiromi Ezaki

doi:10.1117/12.474547

30 July 2002 Improvement of two-photon absorption lithography

Masato Shibuya, Hiromi Ezaki

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474547
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Recently, a novel Resolution Enhancement Technology (RET) have been proposed to overcome the Rayleigh resolution limit by using both entangled photon pair and two-photon absorption resist. However, the illumination intensity is not enough to attain the reasonable throughput. We propose a new method which enables to enhance the resolution over the Rayleigh limit with more strong intensity source by using two-photon absorption resist, where the absorbed two photons have different polarization each other. Since it is recently reported that the stimulated emission of polarization-entangled photons has been achieved, we investigate the effect of such entangled four photons to the resolution enhancement instead of entangled photon pair. Moreover, we also study the application of two-mode squeezing state.

Citation Download Citation

Masato Shibuya and Hiromi Ezaki "Improvement of two-photon absorption lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474547

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available