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30 July 2002 Inspection of chromeless AAPSM
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Abstract
The Chromeless Phase Shift Mask (CLM) approach from ASML MaskTools has been developed as an approach to achieve sub-100nm lithography using currently available stepper technology. The technology uses sub-resolution gray-scaled regions of zero-phase and pi-phase quartz on the mask to produce effective feature widths well below 100nm at the wafer. The features on the mask consist entirely of etched and unetched quartz. No features consist of chrome on the mask. The integration of this type of phase shift mask technology into the photomask-manufacturing environment requires that the mask manufacturer be able to inspect the mask for defects in the quartz. The Defect Sensitivity Monitor (DSM) pattern was used to construct a CLM mask. The mask was inspected using commercially available inspection platforms, and the resulting inspection capability is reported.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Darren Taylor, Matthew Lassiter, Benjamin George Eynon Jr., Douglas J. Van Den Broeke, and J. Fung Chen "Inspection of chromeless AAPSM", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474513
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