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30 July 2002 Model-based corrections for complementary phase-shift mask toward 70-nm technology node
Frank A.J.M. Driessen, Geert Vandenberghe, Monique Ercken, Patrick K. Montgomery, Kurt G. Ronse, Paul van Adrichem, Jason Li, Hua-Yu Liu, Linard Karklin
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Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.490520
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States
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Frank A.J.M. Driessen, Geert Vandenberghe, Monique Ercken, Patrick K. Montgomery, Kurt G. Ronse, Paul van Adrichem, Jason Li, Hua-Yu Liu, and Linard Karklin "Model-based corrections for complementary phase-shift mask toward 70-nm technology node", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.490520
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