An Improved Alignment System For Wafer Steppers

W R. Trutna Jr.; Mung Chen

doi:10.1117/12.941888

29 June 1984 An Improved Alignment System For Wafer Steppers

W R. Trutna Jr., Mung Chen

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941888
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

A diffraction grating alignment system has been demonstrated on a GCA stepper. Registration of better than 0.2 microns, 3 sigma has been achieved on NMOS production wafers.

Citation Download Citation

W R. Trutna Jr. and Mung Chen "An Improved Alignment System For Wafer Steppers", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941888

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