Cad As The Foundation For Quality Assurance In VLSI Fabrication

Raul Brauner; David Pollock; David Bedrosian

doi:10.1117/12.941924

29 June 1984 Cad As The Foundation For Quality Assurance In VLSI Fabrication

Raul Brauner, David Pollock, David Bedrosian

Proceedings Volume 0470, Optical Microlithography III: Technology for the Next Decade; (1984) https://doi.org/10.1117/12.941924
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Fabrication of VLSI devices with complex designs and one micron geometries presents a major challenge in the area of quality assurance. The original CAD design can be used as the reference for inspection, if a mechanism is provided for compensating for the effects of the process on the design. Using this approach, Contrex has developed a system for wafer inspection that accurately predicts the shape of a pattern in photoresist, and is able to detect defects as small as 0.3 microns.

Citation Download Citation

Raul Brauner, David Pollock, and David Bedrosian "Cad As The Foundation For Quality Assurance In VLSI Fabrication", Proc. SPIE 0470, Optical Microlithography III: Technology for the Next Decade, (29 June 1984); https://doi.org/10.1117/12.941924

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