Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry S. Zurbrick; Jan P. Heumann; Maciej W. Rudzinski; Stanley E. Stokowski; Jan-Peter Urbach; Lantian Wang

doi:10.1117/12.476919

1 August 2002 Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques

Larry S. Zurbrick, Jan P. Heumann, Maciej W. Rudzinski, Stanley E. Stokowski, Jan-Peter Urbach, Lantian Wang

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476919
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

This paper discusses the challenges to alternating phase shift mask defect inspection and new approaches for phase defect detection using multiple illumination methods in conjunction with defect detection algorithm modifications. Die-to-die inspection algorithms were developed for the KLA-Tencor 365UV-HR (APS algorithm) and TeraStar SLF27 (TeraPhase algorithm) inspection systems based upon the use of simultaneous transmitted and reflected light signals. The development of an AltPSM programmed test vehicle is described and defect sensitivity characterization results from programmed phase defect reticles are presented. A comparison of the two approaches used for the different inspection systems is discussed. A comparison of TeraPhase to transmitted light only results from a programmed phase defect test mask shows improved phase defect detection results.

Citation Download Citation

Larry S. Zurbrick, Jan P. Heumann, Maciej W. Rudzinski, Stanley E. Stokowski, Jan-Peter Urbach, and Lantian Wang "Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476919

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