High-performance DUV inspection system for 100-nm generation masks

Hideo Tsuchiya; Ikunao Isomura; Kazuhiro Nakashima; Kyoji Yamashita; Toshiyuki Watanabe; Takeshi Nishizaka; Hiroyuki Ikeda; Eiji Sawa; Masami Ikeda

doi:10.1117/12.476961

1 August 2002 High-performance DUV inspection system for 100-nm generation masks

Hideo Tsuchiya, Ikunao Isomura, Kazuhiro Nakashima, Kyoji Yamashita, Toshiyuki Watanabe, Takeshi Nishizaka, Hiroyuki Ikeda, Eiji Sawa, Masami Ikeda

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476961
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

Mask inspection has become a much more important factor in LSI manufacturing. In order to perform mask inspection with high reliability for devices of 100-130 nm rule and below, a high-resolution and high-speed die-to-database inspection system is indispensable. In order to satisfy these requirements, the Toshiba MC-3500, a next-generation mask inspection system using 257nm DUV short wavelength optics, has been developed. The MC-3500 employs a die-to-database comparison method and a high-performance data processing system that is newly developed. This paper reports the system configuration, basic characteristics for defect detection and inspection performance.

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Hideo Tsuchiya, Ikunao Isomura, Kazuhiro Nakashima, Kyoji Yamashita, Toshiyuki Watanabe, Takeshi Nishizaka, Hiroyuki Ikeda, Eiji Sawa, and Masami Ikeda "High-performance DUV inspection system for 100-nm generation masks", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476961

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