Lithography technology trend for DRAM devices

Woo-Sung Han

doi:10.1117/12.477003

1 August 2002 Lithography technology trend for DRAM devices

Woo-Sung Han

Author Affiliations +

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.477003
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

Lithography technology trend is described in view of DRAM devices. Lowering k₁ factor is a way to push the existing exposure tools further down to where an improved tool might take the place. Four different aspects have been studied to lower k₁ factor: resist and resist process, design layout, exposure tool, and complex mask. Thin resist, silicon containing bi-layer resist process, and chemical attaching process (CAP) allows k₁ factor. In a low k₁ factor regime, the importance of a defect level control and CD shrinkage control is mentioned. A litho-friendly design proves to be very effective. From exposure tool point of view, flare effect and lens aberration effect are stressed along with proposing a customized OAI, which proves to be a good method to lower k₁ factor. A novel complex mask with heavy OPC features is introduced. If all or most of the techniques suggested above are realized, moving toward k₁ facto of 0.3 or below will come true. With the era of low k₁ factor of 0.3 or below, ArF lithography can be extended to a device generation of approximately 65 nm which F₂ lithography was thought to be used.

Citation Download Citation

Woo-Sung Han "Lithography technology trend for DRAM devices", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.477003

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE