Pattern recognition in the database of a mask layout

Shih-Ying Chen; Eric C. Lynn; Jaw-Jung Shin

doi:10.1117/12.476935

1 August 2002 Pattern recognition in the database of a mask layout

Shih-Ying Chen, Eric C. Lynn, Jaw-Jung Shin

Proceedings Volume 4754, Photomask and Next-Generation Lithography Mask Technology IX; (2002) https://doi.org/10.1117/12.476935
Event: Photomask and Next Generation Lithography Mask Technology IX, 2002, Yokohama, Japan

Abstract

The request of pattern recognition has been frequently brought up by both mask and wafer engineers. Despite different intentions, pattern recognition is usually the first step of many applications and hence plays a major role to accomplish certain tasks. For the purpose of this work, pattern recognition is defined as searching a specific polygon or a group of particular patterns from a chip layout. Operator scan is truly not an efficient approach of pattern recognition, in particular, for cases with huge design database of advanced semiconductor integrated circuits. Obviously, an automation system of pattern recognition is necessary and benefits the data preparation process. Two categories of pattern recognition are discussed in the present study, 'fuzzy search' and 'exact match.' Each category has its own application, but the searching algorithms could be much different. Details of searching algorithms are given for both categories of pattern recognition. Due to the nature of industrial standard, the scope of the present application is limited to database with GDSII format. Hence, coordinate searching is internally used inside the searching engine.

Citation Download Citation

Shih-Ying Chen, Eric C. Lynn, and Jaw-Jung Shin "Pattern recognition in the database of a mask layout", Proc. SPIE 4754, Photomask and Next-Generation Lithography Mask Technology IX, (1 August 2002); https://doi.org/10.1117/12.476935

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