Paper
19 April 2002 Strength and long-term reliability testing of wafer-bonded MEMS
Matthias Petzold, Dieter Katzer, M. Wiemer, Joerg Bagdahn
Author Affiliations +
Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462863
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France
Abstract
Waferbonding techniques are frequently used for MEMS/MOEMS fabrication. In this paper, the potential application and methodical limitations of different strength testing approaches including tensile testing and double-cantilever- beam testing for wafer-bonded components are investigated. Special attention is given to the influence of the interfacial atomic bonding strength, the role of interface voids and notches caused by chemical or physical etching steps prior to bonding on the fracture limit. A particular aim of the paper is to discuss the potential of the Micro Chevron-Test for the assessment of the wafer bonding process with particular respect to the quality control during MEMS fabrication. In addition, the methods can also be applied to investigate the lifetime and fatigue properties of wafer- bonded samples exposed to constant or cyclic stresses.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthias Petzold, Dieter Katzer, M. Wiemer, and Joerg Bagdahn "Strength and long-term reliability testing of wafer-bonded MEMS", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); https://doi.org/10.1117/12.462863
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Cited by 6 scholarly publications.
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KEYWORDS
Semiconducting wafers

Interfaces

Silicon

Wafer bonding

Wafer testing

Oxides

Reliability

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