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13 September 2002 Chemical and structural modifications in the UV ablation of polymers
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Proceedings Volume 4760, High-Power Laser Ablation IV; (2002) https://doi.org/10.1117/12.482095
Event: International Symposium on High-Power Laser Ablation 2002, 2002, Taos, New Mexico, United States
Abstract
The study examines chemical and structural modifications effected in the UV ablation of polymers. For the study of the chemical processes, aromatic photosensitive compounds with well-defined photochemistry are employed as dopants and their reactivity is examined as a function of laser parameters (fluence, wavelength and laser pulse width). A 'pump-probe' scheme based on laser-induced fluorescence is employed for monitoring photoproduct formation in the polymeric substrate following UV irradiation. Ablation is shown to result in a change of the photolysis degree of the dopant and in the efficient formation of bi-aryl compounds, indicative of a high species mobility. Furthermore, kinetics of photoproduct formation in the ablative regime is shown to differ distinctly from that in the irradiation at low laser fluences. However, the quantitative extent of these changes is critically affected by the absorptivity of the substrate at the irradiation wavelength. On the other hand, structural modifications induced in polymer films are probed via holographic interferometry. Deformations are shown to be induced at distances far away (approximately 2-3 cm) from the irradiation spot. The implications for UV laser material processing schemes are briefly discussed.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Savas K. Georgiou, John Bounos, Athanassia Athanassiou, Dmitrios Anglos, Vivi Tornari, and Costas Fotakis "Chemical and structural modifications in the UV ablation of polymers", Proc. SPIE 4760, High-Power Laser Ablation IV, (13 September 2002); https://doi.org/10.1117/12.482095
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