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16 August 2002 Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop
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Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479338
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany
Abstract
At the 5th NGL Workshop, 28-3OAug200l , the IPL team, headed by Infineon Technologies, has presented overhead foils1 providing an overview of results as achieved with the Ion Projection Lithography Process Development Tool (PDT) which has been developed and realized by IMS-Vienna as part of the 1997-2001 European MEDEA project. Furthermore concepts for a full field (25X25mm2) ion projection stepper and it's wafer throughput potential have been presented.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Kaesmaier, Hans Loeschner, Patrick W.H. de Jager, Albrecht Ehrmann, Stefan Hirscher, Karl Kragler, Reinhard Springer, Gerhard Stengl, and Andreas Wolter "Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479338
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