Noncontact fluorence measurements for inspection and imprint depth control in nanoimprint lithography

Ch. Finder; C Mayer; Hubert Schulz; Hella-Christin Scheer; Marion Fink; Karl Pfeiffer

doi:10.1117/12.479357

16 August 2002 Noncontact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography

Ch. Finder, C Mayer, Hubert Schulz, Hella-Christin Scheer, Marion Fink, Karl Pfeiffer

Proceedings Volume 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2002) https://doi.org/10.1117/12.479357
Event: 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components, 2002, Munich-Unterhaching, Germany

Abstract

Fluorescence microscopy was introduced as a low cost contamination-free method for rapid quality assessment of an imprint process. An optical microscope equipped with a UV- light source was used and the polymer for imprint was labeled with a fluorescent dye, based on perylene- tetracarboxylic acid dianhydride. The fluorescence images were compared with SEM measurements as well as profilometer data. Fluorescence microscopy was successfully applied to detect sticking of the polymer, typical flow defects like filling deficiencies and uniformity of the imprint depth.

Citation Download Citation

Ch. Finder, C Mayer, Hubert Schulz, Hella-Christin Scheer, Marion Fink, and Karl Pfeiffer "Noncontact fluorescence measurements for inspection and imprint depth control in nanoimprint lithography", Proc. SPIE 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (16 August 2002); https://doi.org/10.1117/12.479357

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