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21 November 2002 X-ray lens with kinoform refractive profile created by x-ray lithography
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Abstract
X-ray kinoform lenses were proposed earlier as focusing devices with refractive and diffractive properties. Deep X-ray lithography technique was applied to realize kinoform lenses in thick resist layers PMMA. Created lens has rather short focal distance 20 cm at base energy 17.5 keV and full aperture 1.5mm with outermost segments 2 μm in width. Predicted performance of created lens is compared with simple parabolic lenses. Applications of kinoform lenses are considered and potentials of X-ray lithography for creation new versions of refractive focusing devices are discussed.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leonid Shabel'nikov, Vladimir Nazmov, Franz Josef Pantenburg, Juergen Mohr, Volker Saile, Vecheslav Yunkin, Sergey Kouznetsov, Valery F. Pindyurin, Irina Snigireva, and Anatoly A. Snigirev "X-ray lens with kinoform refractive profile created by x-ray lithography", Proc. SPIE 4783, Design and Microfabrication of Novel X-Ray Optics, (21 November 2002); https://doi.org/10.1117/12.455688
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