Metal nanoparticle arrays for near-field optical lithography

Pieter G. Kik; Andrea L. Martin; Stefan A. Maier; Harry A. Atwater

doi:10.1117/12.450836

4 October 2002 Metal nanoparticle arrays for near-field optical lithography

Pieter G. Kik, Andrea L. Martin, Stefan A. Maier, Harry A. Atwater

Proceedings Volume 4810, Properties of Metal Nanostructures; (2002) https://doi.org/10.1117/12.450836
Event: International Symposium on Optical Science and Technology, 2002, Seattle, WA, United States

Abstract

We have recently proposed a new approach to optical lithography that could be used to replicate arrays of metal nanoparticles using broad beam illumination with visible light and standard photoresist. The method relies on resonant excitation of the surface plasmon oscillation in the nanoparticles. When excited at the surface plasmon frequency, a resonantly enhanced dipole field builds up around the nanoparticles. This dipole field is used to locally expose a thin layer of photoresist, generating a replica of the original pattern in the resist. Silver nanoparticles on photoresist can be resonantly excited at wavelengths ranging from 410 nm to 460 nm, allowing for resonantly enhanced exposure of standard g-line photoresist. Finite Difference Time Domain (FDTD) simulations of isolated silver particles on a thin resist layer show that broad beam illumination with p-polarized light at a wavelength of 439 nm can produce features as small as 30 nm, or λ/14. Depending on exposure time lateral spot sizes ranging from 30 to 80 nm with exposure depths ranging from 12 to 45 nm can be achieved. We discuss the effect of particle-particle interactions in the replica formation process. Experiments on low areal density Ag nanoparticle arrays are discussed. Resist layers (thickness 75 nm) in contact with 40 nm Ag nanoparticles were exposed using 410 nm light and were subsequently developed. Atomic Force Microscopy on these samples reveals nanoscale depressions in the resist, providing evidence for plasmon-enhanced resist exposure.

Citation Download Citation

Pieter G. Kik, Andrea L. Martin, Stefan A. Maier, and Harry A. Atwater "Metal nanoparticle arrays for near-field optical lithography", Proc. SPIE 4810, Properties of Metal Nanostructures, (4 October 2002); https://doi.org/10.1117/12.450836

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available