Deposition of LiNbO3 waveguide by pulsed-laser deposition

Yoshiki Nakata; Soichiro Gunji; Youhei Shimizu; Tatsuo Okada; Mitsuo Maeda

doi:10.1117/12.486589

19 February 2003 Deposition of LiNbO₃ waveguide by pulsed-laser deposition

Yoshiki Nakata, Soichiro Gunji, Youhei Shimizu, Tatsuo Okada, Mitsuo Maeda

Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003) https://doi.org/10.1117/12.486589
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan

Abstract

LiNbO₃ thin films were deposited by pulsed-laser deposition (PLD) method. Crystalline and transparent films were deposited on sapphire substrates at 400 °C and in 100 mtorr of oxygen gas pressure. The waveguide properties, which were waveguide mode and loss, were measured by prism coupling method. Droplet less film was obtained with low ablation laser fluence and without scanning of ablation laser. The smallest waveguide loss was 32.9 dB/cm at present.

Citation Download Citation

Yoshiki Nakata, Soichiro Gunji, Youhei Shimizu, Tatsuo Okada, and Mitsuo Maeda "Deposition of LiNbO₃ waveguide by pulsed-laser deposition", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003); https://doi.org/10.1117/12.486589

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