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19 February 2003 Excimer laser annealing of NiTi shape memory alloy thin film
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Proceedings Volume 4830, Third International Symposium on Laser Precision Microfabrication; (2003)
Event: LAMP 2002: International Congress on Laser Advanced Materials Processing, 2002, Osaka, Japan
NiTi Shape Memory Alloy (SMA) is with great potential for actuation in microsystems. It is particularly suitable for medical applications due to its excellent biocompatibility. In MEMS, local annealing of SMA is required in the process of fabrication. In this paper, local annealing of Ni52Ti48 SMA with excimer laser is proposed for the first time. The Ni52Ti48 thin film in a thickness of 5 μm was deposited on Si (100) wafer by sputtering at room temperature. After that, the thin film was annealed by excimer laser (248nm KrF laser) for the first time. Field-Emission Scanning Electron Microscopy (FESEM) and Atomic Force Microscopy (AFM) were used to characterize the surface profile of the deposited film after laser annealing. The phase transformation was measured by Differential Scanning Calorimeter (DSC) test. It is concluded that NiTi film sputtering on Si(100) substrate at room temperature possesses phase transformation after local laser annealing but with cracks.
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Qiong Xie, Weimin Huang, Ming Hui Hong, Wendong Song, and Tow Chong Chong "Excimer laser annealing of NiTi shape memory alloy thin film", Proc. SPIE 4830, Third International Symposium on Laser Precision Microfabrication, (19 February 2003);

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