High-NA projection lens design for exposure tools

Toshiro Ishiyama; Kotaro Yamaguchi

doi:10.1117/12.486475

23 December 2002 High NA projection lens design for exposure tools

Toshiro Ishiyama, Kotaro Yamaguchi

Proceedings Volume 4832, International Optical Design Conference 2002; (2002) https://doi.org/10.1117/12.486475
Event: International Optical Design Conference 2002, 2002, Tucson, AZ, United States

Abstract

In the history of the semiconductor industry, exposure tools have been improved in resolution. This paper describes how to increase NA of projection lens up to more than 0.7 without increasing lens diameter or deteriorating the aberrations.

Citation Download Citation

Toshiro Ishiyama and Kotaro Yamaguchi "High NA projection lens design for exposure tools", Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); https://doi.org/10.1117/12.486475

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