Overview of optical systems for 30-nm-resolution lithography at EUV wavelengths

Russell M. Hudyma

doi:10.1117/12.486427

23 December 2002 An overview of optical systems for 30 nm resolution lithography at EUV wavelengths

Russell M. Hudyma

Proceedings Volume 4832, International Optical Design Conference 2002; (2002) https://doi.org/10.1117/12.486427
Event: International Optical Design Conference 2002, 2002, Tucson, AZ, United States

Abstract

This paper will present and compare several proposed high numerical aperture Extreme Ultraviolet Lithography (EUVL) projection systems designed for 30 nm resolution.

Citation Download Citation

Russell M. Hudyma "An overview of optical systems for 30 nm resolution lithography at EUV wavelengths", Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); https://doi.org/10.1117/12.486427

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