PROCEEDINGS VOLUME 4889
PHOTOMASK TECHNOLOGY 2002 | 30 SEPTEMBER - 4 OCTOBER 2002
22nd Annual BACUS Symposium on Photomask Technology
PHOTOMASK TECHNOLOGY 2002
30 September - 4 October 2002
Monterey, CA, United States
Introductory Paper
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1 (27 December 2002); doi: 10.1117/12.467389
Materials and Processes I
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 15 (27 December 2002); doi: 10.1117/12.467495
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 25 (27 December 2002); doi: 10.1117/12.468212
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 32 (27 December 2002); doi: 10.1117/12.468605
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 40 (27 December 2002); doi: 10.1117/12.467749
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 50 (27 December 2002); doi: 10.1117/12.467497
Data Preparation and Design
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 59 (27 December 2002); doi: 10.1117/12.467572
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 67 (27 December 2002); doi: 10.1117/12.467751
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 94 (27 December 2002); doi: 10.1117/12.468082
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 104 (27 December 2002); doi: 10.1117/12.468273
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 115 (27 December 2002); doi: 10.1117/12.467577
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 127 (27 December 2002); doi: 10.1117/12.469029
Materials and Processes II
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 137 (27 December 2002); doi: 10.1117/12.467429
Pattern Generation
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 147 (27 December 2002); doi: 10.1117/12.467761
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 157 (27 December 2002); doi: 10.1117/12.468623
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 168 (27 December 2002); doi: 10.1117/12.468198
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 177 (27 December 2002); doi: 10.1117/12.468094
Mask CD Error and Specifications
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 187 (27 December 2002); doi: 10.1117/12.469361
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 197 (27 December 2002); doi: 10.1117/12.467915
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 209 (27 December 2002); doi: 10.1117/12.467479
Defects, Inspection, and Repair
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 221 (27 December 2002); doi: 10.1117/12.467486
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 232 (27 December 2002); doi: 10.1117/12.468275
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 241 (27 December 2002); doi: 10.1117/12.468086
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 247 (27 December 2002); doi: 10.1117/12.467781
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 253 (27 December 2002); doi: 10.1117/12.467436
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 263 (27 December 2002); doi: 10.1117/12.467768
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 271 (27 December 2002); doi: 10.1117/12.468087
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 283 (27 December 2002); doi: 10.1117/12.468200
Mask Metrology
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 293 (27 December 2002); doi: 10.1117/12.467760
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 309 (27 December 2002); doi: 10.1117/12.467430
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 319 (27 December 2002); doi: 10.1117/12.468090
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 328 (27 December 2002); doi: 10.1117/12.468088
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 336 (27 December 2002); doi: 10.1117/12.467907
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 365 (27 December 2002); doi: 10.1117/12.467752
EUV Masks
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 374 (27 December 2002); doi: 10.1117/12.467478
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 382 (27 December 2002); doi: 10.1117/12.468104
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 389 (27 December 2002); doi: 10.1117/12.467578
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 400 (27 December 2002); doi: 10.1117/12.467439
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 408 (27 December 2002); doi: 10.1117/12.468199
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 418 (27 December 2002); doi: 10.1117/12.467896
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 426 (27 December 2002); doi: 10.1117/12.468106
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 431 (27 December 2002); doi: 10.1117/12.468102
Advanced Technology and NGL
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 437 (27 December 2002); doi: 10.1117/12.467903
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 450 (27 December 2002); doi: 10.1117/12.468604
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 469 (27 December 2002); doi: 10.1117/12.467353
Wafer Fab Issues with Masks
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 478 (27 December 2002); doi: 10.1117/12.468211
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 488 (27 December 2002); doi: 10.1117/12.467850
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 498 (27 December 2002); doi: 10.1117/12.467314
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 509 (27 December 2002); doi: 10.1117/12.467909
Resolution Enhancement Techniques (OPC/PSM)
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 520 (27 December 2002); doi: 10.1117/12.468093
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 530 (27 December 2002); doi: 10.1117/12.467897
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 568 (27 December 2002); doi: 10.1117/12.468097
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 579 (27 December 2002); doi: 10.1117/12.467508
Materials and Processes
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 592 (27 December 2002); doi: 10.1117/12.468202
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 599 (27 December 2002); doi: 10.1117/12.468089
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 607 (27 December 2002); doi: 10.1117/12.468085
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 619 (27 December 2002); doi: 10.1117/12.467914
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 626 (27 December 2002); doi: 10.1117/12.467908
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 634 (27 December 2002); doi: 10.1117/12.467905
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 653 (27 December 2002); doi: 10.1117/12.467758
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 667 (27 December 2002); doi: 10.1117/12.467581
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 754 (27 December 2002); doi: 10.1117/12.467246
Pattern Generation
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 759 (27 December 2002); doi: 10.1117/12.468622
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 767 (27 December 2002); doi: 10.1117/12.468466
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 776 (27 December 2002); doi: 10.1117/12.468274
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 786 (27 December 2002); doi: 10.1117/12.468100
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 800 (27 December 2002); doi: 10.1117/12.467750
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 809 (27 December 2002); doi: 10.1117/12.467494
Mask DC Error and Specifications
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 819 (27 December 2002); doi: 10.1117/12.468099
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 826 (27 December 2002); doi: 10.1117/12.467900
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 836 (27 December 2002); doi: 10.1117/12.467579
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 844 (27 December 2002); doi: 10.1117/12.467502
Data Preparation and Design
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 853 (27 December 2002); doi: 10.1117/12.469151
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 861 (27 December 2002); doi: 10.1117/12.467917
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 879 (27 December 2002); doi: 10.1117/12.467853
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 887 (27 December 2002); doi: 10.1117/12.467851
Defects, Inspection, and Repair
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 909 (27 December 2002); doi: 10.1117/12.468628
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 922 (27 December 2002); doi: 10.1117/12.468210
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Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1048 (27 December 2002); doi: 10.1117/12.467434
Advanced Technology and NGL
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 457 (27 December 2002); doi: 10.1117/12.467388
Defects, Inspection, and Repair
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1056 (27 December 2002); doi: 10.1117/12.467357
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1065 (27 December 2002); doi: 10.1117/12.467298
Mask Metrology
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1073 (27 December 2002); doi: 10.1117/12.467918
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1085 (27 December 2002); doi: 10.1117/12.467779
Extreme Ultraviolet
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1092 (27 December 2002); doi: 10.1117/12.468213
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1099 (27 December 2002); doi: 10.1117/12.468103
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1106 (27 December 2002); doi: 10.1117/12.468101
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1113 (27 December 2002); doi: 10.1117/12.467778
Advanced Technology and NGL
Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, pg 1121 (27 December 2002); doi: 10.1117/12.468606