Aerial image measurement system for 157-nm lithography

Klaus Eisner; Peter Kuschnerus; Jan-Peter Urbach; Christof M. Schilz; Thomas Engel; Axel M. Zibold; Takashi Yasui; Iwao Higashikawa

doi:10.1117/12.467353

27 December 2002 Aerial Image Measurement System for 157 nm Lithography

Klaus Eisner, Peter Kuschnerus, Jan-Peter Urbach, Christof M. Schilz, Thomas Engel, Axel M. Zibold, Takashi Yasui, Iwao Higashikawa

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Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467353
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

The worldwide first Aerial Image Measurement System (AIMS) for 157 nm lithography has been used to measure binary chrome and attenuated phase shift masks at 157 nm wavelength. The AIMS measurements were done for line structures from 200 nm up to 400 nm and for 500 nm contacts. Through focus series have been conducted to calculate the process windows for various structures and feature sizes.

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Klaus Eisner, Peter Kuschnerus, Jan-Peter Urbach, Christof M. Schilz, Thomas Engel, Axel M. Zibold, Takashi Yasui, and Iwao Higashikawa "Aerial Image Measurement System for 157 nm Lithography", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467353

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