Alt-PSM of contact with phase-assist feature for 65-nm node

Jan-Wen You; Jaw-Jung Shin; Chung-Hsing Chang; Li-Wei Kung; Bin-Chang Chang; Chang-Min Dai; Tsai-Sheng Gau; Burn Jeng Lin

doi:10.1117/12.467499

27 December 2002 Alt-PSM of Contact with Phase Assist Feature for 65-nm Node

Jan-Wen You, Jaw-Jung Shin, Chung-Hsing Chang, Li-Wei Kung, Bin-Chang Chang, Chang-Min Dai, Tsai-Sheng Gau, Burn Jeng Lin

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467499
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Resolving the very small feature size of contact holes for 65-nm technology node has placed enormous challenge on even the up-to-date optical lithography techniques. Resolution enhancement technique (RET) will be helpful and necessary to alleviate the strain posed by such a task. Here we report that a 193-nm alternating phase shift mask (Alt-PSM) with phase-shifted assist features is used to print the contact holes for 65-nm node. With a novel algorithm of phase assignment, the phases of the main features are assigned properly in the full chip with the assistant features added. The results show that DOF of 110-nm iso-contact hole can be enhanced up to 0.5 μm.

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Jan-Wen You, Jaw-Jung Shin, Chung-Hsing Chang, Li-Wei Kung, Bin-Chang Chang, Chang-Min Dai, Tsai-Sheng Gau, and Burn Jeng Lin "Alt-PSM of Contact with Phase Assist Feature for 65-nm Node", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467499

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