Complementary double-exposure technique (CODE) solutions to the two-dimensional structures of 90-nm node

Serdar Manakli; Yorick Trouiller; Olivier Toublan; Patrick Schiavone; Yves Fabien Rody; Pierre Jerome Goirand

doi:10.1117/12.468203

27 December 2002 Complementary Double Exposure Technique (CODE) solutions to the two-dimensional structures of the 90nm node

Serdar Manakli, Yorick Trouiller, Olivier Toublan, Patrick Schiavone, Yves Fabien Rody, Pierre Jerome Goirand

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468203
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

In a recent paper, we proposed a new manufacturable Reticule Enhancement Technique (RET) using two binary masks, called CODE (Complementary Double Exposure). We demonstrated the printability of 80nm dense (300nm pitch), semi-dense and isolated lines using this technique and showed good performance using an ArF 0.63NA scanner. To be able to use the CODE RET in production, we must be able to handle complex two-dimensional structures as well. In this paper we study the representative two-dimensional complex structures of a circuit in order to have a complete overview of this technique. We analyze the impact of the asymmetrical apertures and the impact of the 2^nd mask overlap to the 1^st mask. We show that asymmetrical apertures impact the line width of the non-critical lines. We also show that the 2^nd mask has not only the role of protecting the exposed part. It also contributes strongly to the printability of the complex structures by correcting the defects of the 1^st exposure. Finally, we show the results of CODE technique applied to a portion of a real circuit using all the developed rules.

Citation Download Citation

Serdar Manakli, Yorick Trouiller, Olivier Toublan, Patrick Schiavone, Yves Fabien Rody, and Pierre Jerome Goirand "Complementary Double Exposure Technique (CODE) solutions to the two-dimensional structures of the 90nm node", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468203

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available