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27 December 2002 Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks
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Abstract
Extreme ultraviolet (EUV) multilayer defects (phase defects) are a defect type unique to extreme ultraviolet lithography (EUVL) masks. A manufacturable inspection capability for these defects is key to the success of EUV lithography. Simulations of EUV scattering from multilayer defects suggest that defect printability is related to the phase error induced by the defect, which is in turn strongly coupled to the size of a multilayer surface protrusion or intrusion. We can adopt a strategy of measuring the multilayer surface to detect phase defects. During the past year a working group composed of members of Intel Corporation, Lawrence Berkeley and Lawrence Livermore National Laboratories, and International Sematech searched for a commercial tool for EUVL mask substrate and blank inspection. This working group established the tool requirements, methodologies for tool evaluation, collected data and recommended a supplier for further development with International Sematech. We collected data from several vendors and found that a multibeam confocal inspection (MCI) system had a capability significantly better than the tools used today. We will present our strategy, requirements, methodologies and results. We will discuss in detail our unique programmed substrate and multilayer defect masks used to support the tool selection, including their actinic characterization. We will present data that quantifies the inspection capability of the MCI system.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alan R. Stivers, Ted Liang, Michael J. Penn, Barry Lieberman, Gilbert V. Shelden, James A. Folta, Cindy C. Larson, Paul B. Mirkarimi, Christopher C. Walton, Eric M. Gulliksong, and Moonsuk Yi "Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468199
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