Integration of antireflection coatings on EUV absorber stacks

James R. Wasson; Sang-In Han; N. V. Edwards; Eric Weisbrod; William J. Dauksher; Pawitter J. S. Mangat; Donald W. Pettibone

doi:10.1117/12.468104

27 December 2002 Integration of Anti-reflection Coatings on EUV Absorber Stacks

James R. Wasson, Sang-In Han, N. V. Edwards, Eric Weisbrod, William J. Dauksher, Pawitter J. S. Mangat, Donald W. Pettibone

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468104
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Extreme ultraviolet lithography (EUVL) is the leading candidate for next generation lithography with the potential for extendibility beyond the 50-nm node. The inspection contrast of DUV and 193nm optical reticles is essentially 100%; however, EUVL reticles are reflective in nature and do not allow for transmissive inspection. The Mo/Si multilayer (ML) mirror has a reflectivity of 55-60% with 257nm illumination. The reflectivity of the multilayer at the inspection wavelength dictates that the patterned areas of the mask must be dark to achieve high inspection contrast (i.e., 0% reflectivity at the inspection wavelength). Furthermore, the reticle should retain the same tone during the pre-repair stage and the final reticle stage to allow reuse of inspection algorithms and easier defect repair verification. The use of an anti-reflection coating (ARC) on a TaN absorber has been shown . This article will describe additional options for a wide range of anti-reflection coatings and their impact on the design and fabrication of the EUV absorber stack. Both experimental and modeling results will be presented for different absorber stack configurations.

Citation Download Citation

James R. Wasson, Sang-In Han, N. V. Edwards, Eric Weisbrod, William J. Dauksher, Pawitter J. S. Mangat, and Donald W. Pettibone "Integration of Anti-reflection Coatings on EUV Absorber Stacks", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468104

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available