Line edge roughness comparison between wet and dry etched reticles

Kunal N. Taravade; Robert C. Muller; Susan Erichsrud

doi:10.1117/12.467246

27 December 2002 Line Edge Roughness Comparison Between Wet and Dry Etched Reticles

Kunal N. Taravade, Robert C. Muller, Susan Erichsrud

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Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467246
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

We present a comparison of line edge roughness on wet and dry etched reticles manufactured at the same mask shop. These measurements were taken on a Leica LWM250, and compare identical features on both masks. A 30% improvement in line edge quality was seen on the dry etched plates. Data supporting these results is presented.

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Kunal N. Taravade, Robert C. Muller, and Susan Erichsrud "Line Edge Roughness Comparison Between Wet and Dry Etched Reticles", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467246

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