Partitioning of photomask processes for defects: II.

Charles H. Howard; Matthew J. Lamantia

doi:10.1117/12.467855

27 December 2002 Partitioning of Photomask Processes for Defects: II.

Charles H. Howard, Matthew J. Lamantia

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467855
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Reticle defects are one leading source of yield loss. This paper is a continuation of work begun to track defect sources to the process steps that generate them. Prior work was done on a common electron beam resist. This study will examine a DUV optical chemically amplified resist.

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Charles H. Howard and Matthew J. Lamantia "Partitioning of Photomask Processes for Defects: II.", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467855

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