Performance of proximity gap suction development (PGSD)

Hideaki Sakurai; Masamitsu Itoh; Yukihiko Esaki; Kotaro Ooishi; Kazuo Sakamoto; Mika Nakao; Toshiharu Nishimura; Hiroyuki Miyashita; Naoya Hayashi

doi:10.1117/12.467297

27 December 2002 Performance of Proximity Gap Suction Development (PGSD)

Hideaki Sakurai, Masamitsu Itoh, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, Naoya Hayashi

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467297
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

The loading effect is becoming a great issue in mask fabrication. To reduce CD error due to resist load, we have developed a developer based on a new concept, Proximity Gap Suction Development (PGSD), involving the use of a nozzle to spout developer and suck in dirty developer. In this paper, the performance of PGSD is reported.

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Hideaki Sakurai, Masamitsu Itoh, Yukihiko Esaki, Kotaro Ooishi, Kazuo Sakamoto, Mika Nakao, Toshiharu Nishimura, Hiroyuki Miyashita, and Naoya Hayashi "Performance of Proximity Gap Suction Development (PGSD)", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467297

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