STEAG HamaTech resist coater ASR5000: tool concept and process results

Christian Krauss; Uwe U. Dietze; Fei Xu; Corinna Koepernik; Peter Dress; Peter Voehringer; Mathias Irmscher; Jakob Szekeresch

doi:10.1117/12.467509

27 December 2002 STEAG HamaTech Resist Coater ASR5000 - tool concept and process results -

Christian Krauss, Uwe U. Dietze, Fei Xu, Corinna Koepernik, Peter Dress, Peter Voehringer, Mathias Irmscher, Jakob Szekeresch

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.467509
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Utilizing the balance of capillary forces and adhesion, a liquid material, e.g. photo resist, can be applied to the surface of a face down mounted substrate. STEAG HamaTech's Advanced single Substrate Resist coater, ASR5000, is combining patented capillary apply technology, and a patented face-down spin process, to enable fringe free uniform coatings on rectangular substrates. CAP COATing technology reduces resist consumption by a factor of at least 10 over conventional coating methods. Face down spin, provides highly uniform resist spread without risk of backside contamination. The principle equipment concept and capability is presented. Coating and bake performance is discussed for IP3600 and ZEP7000A. Coating uniformities, of smaller ±0.7% at a 4500Å thick IP3600 film and smaller ±0.4% at a 3000Å thick ZEP7000A resist film were achieved, respectively. The repeatability of the coating performance and the post coat bake process (PCB) are demonstrated.

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Christian Krauss, Uwe U. Dietze, Fei Xu, Corinna Koepernik, Peter Dress, Peter Voehringer, Mathias Irmscher, and Jakob Szekeresch "STEAG HamaTech Resist Coater ASR5000 - tool concept and process results -", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.467509

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