Use of nanomachining for 100-nm mask repair

Bob LoBianco; Roy White; Ted Nawrocki

doi:10.1117/12.468628

27 December 2002 Use of Nanomachining for 100 Nanometer Mask Repair

Bob LoBianco, Roy White, Ted Nawrocki

Author Affiliations +

Proceedings Volume 4889, 22nd Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.468628
Event: Photomask Technology 2002, 2002, Monterey, CA, United States

Abstract

Nanomachining has recently been introduced as a new technology for subtractive repair of 130-nanometer masks. The RAVE LLC nm1300 utilizes this innovative strategy, facilitating repairs of all materials currently used in mask production. This technology has allowed 130-nanometer mask repair specifications to be met. This paper introduces nanomachining as a method of repairing next generation 100-nanometer masks. Emphasis will be given to materials and designs that provide significant challenges to current industry repair techniques; specifically quartz bumps on alternating phase shift masks and repairs within tight lines and spaces. Several advantages will be demonstrated, including the ability to machine within high aspect ratio features, the capability to duplicate edge slope, superior edge placement control, quartz bump repair, and transmission values approaching defect-free areas. This paper will compare performance to the SIA roadmap requirements for 100-nanometer mask repair using RAVE LLC’S next generation system, the nm1000.

Citation Download Citation

Bob LoBianco, Roy White, and Ted Nawrocki "Use of Nanomachining for 100 Nanometer Mask Repair", Proc. SPIE 4889, 22nd Annual BACUS Symposium on Photomask Technology, (27 December 2002); https://doi.org/10.1117/12.468628

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