Influence on the film properties of torch inclination angle in the FHD process

Yong-Gon Seo; Sang-Hee Shin; Oh-Duk Kwon; Byung-Moon Lee; Yong-Tak Kim; Dae-Ho Yoon; Hyung-Do Yoon; Je-Min Kim; Young-Min Im

doi:10.1117/12.481246

28 August 2002 Influence on the film properties of torch inclination angle in the FHD process

Yong-Gon Seo, Sang-Hee Shin, Oh-Duk Kwon, Byung-Moon Lee, Yong-Tak Kim, Dae-Ho Yoon, Hyung-Do Yoon, Je-Min Kim, Young-Min Im

Author Affiliations +

Proceedings Volume 4904, Optical Fiber and Planar Waveguide Technology II; (2002) https://doi.org/10.1117/12.481246
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China

Abstract

The refractive index and the film thickness were measured by the prism coupler, and GeO2 and P2O5 concentration were analyzed by EPMA (Electron Probe Micro Analysis) according to the torch inclination angle and the distance between torch and substrate. As the torch angle was steeper, the thickness and the GeO2 concentration were increased, and the P2O5 concentration was decreased for the angle greater than 45o.

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Yong-Gon Seo, Sang-Hee Shin, Oh-Duk Kwon, Byung-Moon Lee, Yong-Tak Kim, Dae-Ho Yoon, Hyung-Do Yoon, Je-Min Kim, and Young-Min Im "Influence on the film properties of torch inclination angle in the FHD process", Proc. SPIE 4904, Optical Fiber and Planar Waveguide Technology II, (28 August 2002); https://doi.org/10.1117/12.481246

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