Deposition of Er3+:Al2O3 films by closed-field unbalanced magnetron sputtering and photoluminescence characterization of the films

Chengren Li; Changlie Song; Shufeng Li; Wenxong Rao

doi:10.1117/12.480976

29 August 2002 Deposition of Er³⁺:Al₂O₃ films by closed-field unbalanced magnetron sputtering and photoluminescence characterization of the films

Chengren Li, Changlie Song, Shufeng Li, Wenxong Rao

Author Affiliations +

Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.480976
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China

Abstract

Er³⁺-doped A1₂0₃ thin films are deposited on silicon substrates by reactive closed-field unbalanced magnetron sputtering(CFUBMS).The process parameters,such as target bias voltage, substrate bias voltage, 0₂ gas flows, sputtering gas pressure,are studied.The thin film properties of interest are Al/O ratio,thickness,refractive index,crystallographic structure and surface roughness. 1.53μm photoluminescence(PL) characterization pumping at wavelength 980nm is measured.The relationship between PL peak intensity and different anneal temperature, and different pumping power is experimental investigated.

Citation Download Citation

Chengren Li, Changlie Song, Shufeng Li, and Wenxong Rao "Deposition of Er³⁺:Al₂O₃ films by closed-field unbalanced magnetron sputtering and photoluminescence characterization of the films", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.480976

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