Highly uniform and highly reliable 850-nm VCSEL platform for high-speed optical communications

Hao Chung Kuo; Z. Q. Shi; Minh Trieu; Xuesong Dong; Ghulam Hasnain; Chih Ping Kuo; Andrew Liao

doi:10.1117/12.481016

29 August 2002 Highly uniform and highly reliable 850-nm VCSEL platform for high-speed optical communications

Hao Chung Kuo, Z. Q. Shi, Minh Trieu, Xuesong Dong, Ghulam Hasnain, Chih Ping Kuo, Andrew Liao

Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.481016
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China

Abstract

In this paper, we report a high performance, highly uniform, and highly reliable VCSEL platform at LuxNet Corporation. The proprietary design of this VCSEL gives it oxide VCSEL-like performance and an implant VCSEL-like reliability. Threshold currents are between 1 .0 to 2.5 mA, and the slope efficiencies are between 0.3 to 0.5W/A. The threshold current change with temperature is minimal and the slope efficiency change less than ~30% when the substrate temperature is raised from 25°C to 90°C. The eye diagram of LuxNet TOSA operating at 2.5 GB/s with 6mA bias and 10dB extinction ratio shows very clean eye with jitter less than 3Ops. We have accumulated life test data up to 5000 hours at 100°C/2OmA with exceptional reliability. And the WHTOL (85/85) bias at 8mA has passed over 3000 hours. In addition, the overall yield across a 3 inch wafer is over 90%. The chips are now being shipped in commercial quantities. Finally, we will present our preliminary results of 10 Gb/s VCSEL.

Citation Download Citation

Hao Chung Kuo, Z. Q. Shi, Minh Trieu, Xuesong Dong, Ghulam Hasnain, Chih Ping Kuo, and Andrew Liao "Highly uniform and highly reliable 850-nm VCSEL platform for high-speed optical communications", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.481016

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