Scatter analysis for particle contamination of a bisymmetric reflective system

Andrew Cheng

doi:10.1117/12.479541

20 September 2002 Scatter Analysis for Particle Contamination of a Bi-Symmetric Reflective System

Andrew Cheng

Proceedings Volume 4927, Optical Design and Testing; (2002) https://doi.org/10.1117/12.479541
Event: Photonics Asia, 2002, Shanghai, China

Abstract

We demonstrate a step-by-step procedure of conducting a straylight scatter analysis due to particle contamination study using ASAP (Advanced System Analysis Program), a versatile, time-tested commercial software for modeling in optical and illumination systems, including wave effects, diffractive and scattering phenomenon. We hope to demonstrate that scalar optical modeling technology is mature and is highly suitable for commercial applications that are beginning to show higher demands in Signal-to-Noise ratios. Other systems that can be modeled include photonic fiber coupling systems, liquid crystal display technology, MEMS devices, as well as high intensity arc sources.

Citation Download Citation

Andrew Cheng "Scatter Analysis for Particle Contamination of a Bi-Symmetric Reflective System", Proc. SPIE 4927, Optical Design and Testing, (20 September 2002); https://doi.org/10.1117/12.479541

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