Writing process of multiwavelength photochromic storage

Xuesong Mai; Duanyi Xu; Guosheng Qi; Hui Zhao

doi:10.1117/12.483358

17 September 2002 Writing process of multiwavelength photochromic storage

Xuesong Mai, Duanyi Xu, Guosheng Qi, Hui Zhao

Proceedings Volume 4930, Advanced Optical Storage Technology; (2002) https://doi.org/10.1117/12.483358
Event: Photonics Asia, 2002, Shanghai, China

Abstract

Multi-wavelength photochromic storage is a new optical storage method based on the photochromic principle. In this paper, the storage method itself and the mathematic model developed to describe the change of the reflectance in the writing process are discussed. For the photochromic materials, which are sensitive to 650 nm and 532 nm laser respectively and mixed into one layer, the reflectance of the readout laser in the writing process was measured with a 3-wavelength photochromic storage system. The theoretical results of the model agree well with the experimental ones. It is also found that the photochromic optical storage has no threshold.

Citation Download Citation

Xuesong Mai, Duanyi Xu, Guosheng Qi, and Hui Zhao "Writing process of multiwavelength photochromic storage", Proc. SPIE 4930, Advanced Optical Storage Technology, (17 September 2002); https://doi.org/10.1117/12.483358

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