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Significant advances have been made in the area of reactive sputtering to accommodate industry requirements for high performance coatings. A review is presented of progress in the field, highlighting the results of studies of specific films produced by various techniques. Ion beam sputtering, originally exploited for producing laser gyro coatings, has become one of the standard methods of producing narrow band filters for dense wavelength division multiplexing (DWDM) in the telecommunications industry. More recently, other techniques have also emerged exploiting advances made in the opto-electronics industry, notably high-density remote plasma techniques. It has been found that no process is able to generate films that are entirely free of defects, but significant differences occur in the geometrical form of the defects produced. Some are suggestive of the role that vapor-liquid-solid growth mechanisms may play in their formation.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Keith L. Lewis, Gilbert W. Smith, and Alan J. Pidduck "Nodular defects in sputtered coatings", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003);

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