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30 May 2003 Radiation resistance of optical materials against synchrotron radiation
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Radiation resistance of optical materials against synchrotron radiation is important, if optical components for the high energetic regime have to be produced. In the framework of the European project EUFELE, which deals with the development of optical coatings for the free electron laser at ELETTRA (Trieste), a set of CaF2 substrates was irradiated with synchrotron radiation. The synchrotron radiation was varied by wavelength, dose, and high energetic background illumination. Before and after irradiation, the CaF2 substrates were investigated spectrophotometrically in the VUV, VIS and IR range. The surface topology was characterized by Nomarski microscope methods. Structure investigations were carried out with X-ray diffraction measurements. CaF2 shows different types of degradation like color center formation, surface modification, and increased VUV absorption bands. Defect formation will be presented in dependence of synchrotron irradiation conditions.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stefan Guenster, Holger Blaschke, Detlev Ristau, Alexandre Gatto, Joerg Heber, Norbert Kaiser, B. Diviacco, Marino Marsi, Mauro Trovo, Francesca Sarto, Salvatore Scaglione, and Enrico Masetti "Radiation resistance of optical materials against synchrotron radiation", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, (30 May 2003);

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