Fabrication of photonic crystal waveguide elements on SOI

Sanna Yliniemi; Timo T. Aalto; Päivi Heimala; Panu Pekko; Konstantins Jefimovs; Janne Simonen; Tero Uusitupa

doi:10.1117/12.468303

3 April 2003 Fabrication of photonic crystal waveguide elements on SOI

Sanna Yliniemi, Timo T. Aalto, Päivi Heimala, Panu Pekko, Konstantins Jefimovs, Janne Simonen, Tero Uusitupa

Proceedings Volume 4944, Integrated Optical Devices: Fabrication and Testing; (2003) https://doi.org/10.1117/12.468303
Event: Photonics Fabrication Europe, 2002, Bruges, Belgium

Abstract

Photonic crystal angle elements fabricated in silicon-on-insulator (SOI) are reported. These elements are modelled using three-dimensional finite difference time domain (FDTD) method. Photonic crystals have a two-dimensional trigonal lattice structure with cylindrical air columns. The period of the crystal is approximately 420 nm and the cylinder diameter is about 330 nm. Defect creation is performed by removing air columns from certain lattice sites. The SOI-layer is one micron thick and it also defines the column height. The FDTD modelling results imply that photonic crystal angle elements with lower height do not exhibit proper light transmission at the telecommunications wavelength window, 1550 nm. FDTD modelling results give higher transmission for TE-polarised light than for TM-polarisation. For better light coupling a taper element with widened waveguide end is designed.

Citation Download Citation

Sanna Yliniemi, Timo T. Aalto, Päivi Heimala, Panu Pekko, Konstantins Jefimovs, Janne Simonen, and Tero Uusitupa "Fabrication of photonic crystal waveguide elements on SOI", Proc. SPIE 4944, Integrated Optical Devices: Fabrication and Testing, (3 April 2003); https://doi.org/10.1117/12.468303

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